Hitachi S-4500 SEM Manufacturer:Hitachi Condition:Used,we sell it at AS IS(Refurbished and Installation are optional) Price:Best Offer Amount: 3 sets Description of S-4500 SEM Cold Field Emission SEM System: Performance: Secondary electron image resolution: 1.5 nm at 15kv Magnification: 20X - 500KX Electron Optics: Electron gun: Cold field emmission source ...">

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              Home > Electronic, IT & Office Equipment > Electronic Manufacturing Machinery > Metrology & Inspection Hitachi S-4500 SEM
              Global Nanotech Equipment Co.
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              Metrology & Inspection Hitachi S-4500 SEM
              Metrology & Inspection > Hitachi S-4500 SEM
              Manufacturer:Hitachi
              Condition:Used,we sell it at AS IS(Refurbished and Installation are optional)
              Price:Best Offer
              Amount: 3 sets

              Description of S-4500 SEM Cold Field Emission SEM System:
              Performance:
              Secondary electron image resolution: 1.5 nm at 15kv
              Magnification: 20X - 500KX

              Electron Optics:
              Electron gun: Cold field emmission source
              Lens type: electromagnetic
              Objective aperture: 4 position externally selectable
              Stigmator: Octopole electromagnetic
              Scanning coil: 2-stage electromagnetic

              Sample Chamber
              Size: Type I
              Airlock: prepumped, max sample size:50 mm diameter
              Stage motion: 5 axis manual

              Draw-out door: Max sample size:150 mm dia.
              Size: Type II
              Airlock: prepumped, max sample size:100 mm or 150 mm diameter
              Stage motion: 5 axis manual


              Display system:
              Image display: Dual 12" monitors
              Scanning mode: Normal, reduced area , line scan, photo scan, spot position, split screen
              Scanning speed: TV, 0.3, 2, 9, 25, 35, 100, 160 320 s/frame
              Signal processing:Real-time processing, auto-brightness and contrast control, dynamic stigmator, sutofocus, a
              Frame averaging, frame integration, contrast conversion,

              Vacuum system:
              Full automatic operation with pneumatic valve control
              Ultimate vacuum: 10 (-7) Pa in electron gun chamber, 10(-4) Pa in specimen chamber
              Ion pump: 60 L/s X1, 20 L/s X2
              Speciment chamber: DP (570 L/s);Turbo Optional
              Foreline: Rotary pump X2

              Accessories (Optional)
              Optional New EDX system: Energy Dispersive X- Ray Spectrometer QUANTAX 200

              Digital Image capturing: Orion-6 software, Optional
              Chilled water circulator: 10 - 20 deg C, 1.0 -1.5 L/m for DP only

              Installation
              AC: Single phase AC 220 or 240 volt, 50/60 Hz
              Grounding: Independent grounding 100 Ohms or less

              NOTE:
              (1) Tool configuration shown is accurate to the knowledge of Global Nanotech Equipment. Actual configuration may vary. Buyer is advised to conduct it''s own inspections.
              (2) The above description and photos are only for reference.

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